- Title
- Surface engineering to reduce the interfacial resistance for enhanced photocatalytic water oxidation
- Creator
- Yan, Junqing; Liu, Jing; Ji, Yujin; Batmunkh, Munkhbayar; Li, Dan; Liu, Xiaoshuang; Cao, Xingzhong; Li, Youyoung; Liu, Shenzhong; Ma, Tianyi
- Relation
- ACS Catalysis Vol. 10, Issue 15, p. 8742-8750
- Publisher Link
- http://dx.doi.org/10.1021/acscatal.0c02063
- Publisher
- American Chemical Society
- Resource Type
- journal article
- Date
- 2020
- Description
- Interfacial resistance of the charge carriers across TiO₂ to cocatalysts is one of the main limiting factors for realizing high photocatalytic efficiency of water oxidation. Herein, an amorphous TiOₓ layer is introduced on the surface of crystalline TiO₂ catalyst to form the core-shell structure (am@TiO₂) via an oxidation corrosion method. Owing to the surface disordered Ti-O layer, the obtained am@TiO₂ exposes abundant -OH groups for the homogeneous loading of nanosized IrOₓ, while the charge carrier interfacial migration is substantially enhanced. The as-prepared IrOₓ-am@TiO₂ exhibits photocatalytic water oxidation performance with an O₂ evolution rate of 143.6 µmol/g·h, which is approximately 14 times higher than that of the bare am@TiO₂. Moreover, an apparent quantum yield (AQY) of 18.99% is obtained under LED-405 illumination. This work provides a direction for improving the photocatalytic performance and helps to gain a fundamental understanding of the water oxidation steps.
- Subject
- TiO₂; water oxidation; hole-transfer; photocatalysis; IrOₓ; cocatalyst
- Identifier
- http://hdl.handle.net/1959.13/1439272
- Identifier
- uon:40875
- Identifier
- ISSN:2155-5435
- Language
- eng
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